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Calcium Fluoride (Lithography)

Product Information

Calcium fluoride single crystals grown from highly pure raw materials are required for 45 nm node lithography technology. 

  • Key quality features are:
  • Excellent UV transmittance,
  • High laser damage threshold,
  • Low axial and radial stress birefringence,
  • High refractive-index homogeneity.

The very high laser damage threshold of Calcium-fluoride (CaF2) makes it the first choice material for excimer laser optics, beam delivery and illumination systems operating at 45 nm node.

Employment of new types of vacuum furnaces allows fabrication of CaF2 blanks in diameters up to 350 mm and thicknesses exceeding 100 mm.